The influence of nitrogen to hydrogen ratio and temperature on thickness and phase composition in plasma nitrided Ti-6Al-4V

Abstract

Ti-6Al-4V was plasma nitrided using several N2/H2 ratios and substrate temperatures. In order to investigate
the combined influence of these parameters on phase composition and thickness of the coatings, the phases in
the as received, annealed, and nitrided Ti-6Al-4V samples were identified with Rietveld refinement. In the
as-received and annealed samples the structure parameters of -Ti and -Ti were slightly changed, due to the
substitution of titanium atoms by Al or V in the - and -Ti unit cells. A combination of multiple angle grazing
incidence X-ray diffraction, nuclear reaction analysis and cross sectional micrographs showed compound
layers consisting of an outer layer of stoichiometric -TiN over a phase mixture of -TiN and -Ti2N, formed
on top of a nitrogen diffusion region in the alloy. Higher nitriding temperatures induced thicker compound
layers, and higher nitrogen content of the plasma induced thicker fine-grained -TiN top layers.
Keywords: plasma nitriding, Ti-6Al-4V, titanium nitride, Rietveld analysis.