Influence of zirconium addition on microstructure, hardness and oxidation resistance of tantalum nitride thin films

Abstract

Ta1-xZrxN thin films were deposited by reactive magnetron sputtering aiming to investigate the influence of zirconium addition on the microstructure, hardness and high temperature oxidation resistance of the coatings. GAXRD showed that all Ta1-xZrxN thin films maintained ZrN crystalline structure, forming a TaZrN solid solution. Zr incorporation did not alter hardness values of Ta1-xZrxN coatings, however, promoted significant improvements in the oxidation resistance when compared to pure TaN thin films.

Keywords: Thin films; Magnetron sputtering; Tantalum nitride; Nanohardness; High temperature oxidation.